薛 富 盛 教授兼工學院院長
   
研究室:M414
聯絡電話:04-22840430#301
專線電話:04-22870114
                  04-22851549

傳 真   :04-22852862
E-Mail :
fsshieu@dragon.nchu.edu.tw
個人網址:
audi.nchu.edu.tw/~fsshieu/

 Professor / Dean, College of Engineering
Ph. D., Cornell University, U.S.A.
Phone :  04-22840430#301
              04-22870114
              04-22851549

Fax:04-22852862
E-mail :
fsshieu@dragon.nchu.edu.tw
Website : audi.nchu.edu.tw/~fsshieu

   
院長的話:  
       工學院為一具有悠久歷史與優良傳統的學術單位,它參與台灣經濟的起飛,見證台灣產業發展的軌跡,為國家培育無數的工程師、企業家與學術菁英,引領中台灣科技與產業的發展;擁有六個學系及四個獨立所,超過150位具博士學位的專任師資及近4000名學生,是台灣大學校院中最具規模的工程學院。
中部地區為國內精密機械產業的重鎮,隨著中部科學園區的成立,本院師生所扮演的角色益形重要,產學合作向為本院的發展重點與強項,學術卓越為我們追求的目標,我們的學術表現反應在工程領域與材料領域分別進入世界前1 %機構排名,世界排名也進入前200大。
近年來,我們積極推動國際化,鼓勵學生出國學習與選讀雙聯學位,推動國際學術合作,也積極招收國際生來院就讀,並為姊妹校學生舉辦暑期研習營,加強本院與姊妹校的互動與合作,對提升學生國際視野與本校國際聲望有莫大的助益。
中興大學坐落於人文薈萃的台中市,溫和的氣候及優越的地理位置,有助於孕育學術的生命力,工學院未來的發展前途似錦,我們應掌握絕佳的歷史契機,共同致力於高等教育品質的提升與學術研究的卓越,對人類做出最大的貢獻。

     The College of Engineering at National Chung Hsing University has a distinguished history and excellent tradition. It has contributed enormously to Taiwan’s economic growth: it has trained numerous engineers, entrepreneurs, and academic elites who have spearheaded the industry and technological development of Taiwan. One of the largest engineering colleges in Taiwan, the College of Engineering at National Chung Hsing University consists of six departments and four graduate institutes, having more than 150 faculty members with Ph. D. degree and close to 4000 students. It has been a major factor in the progress of local industry and technology advancement in central Taiwan.
Central Taiwan has been the headquarters for Taiwan’s precision machinery and tool industries, among other things. With the establishment of the Central Science Park in 2003, the College has been playing an increasingly important role in many ways. Collaboration between academia and industry has been one of the College’s strength, and it will continue to be emphasized in the future. As a research university, the College pursues academic excellence along with quality education. According to a recent report, two of our research fields, i.e., Engineering and Materials Science, are listed among top 1% in the world, and the College is ranked among the best 200 engineering colleges in the world.
Over the years, we aggressively promote globalization in the college. Students are encouraged to participate in the exchange programs and dual-degree program, and faculty members join the international collaboration. Many foreign students have chosen to pursue advanced degrees in our college. We hold summer school each year for students from our sister universities, as a part of our effort to strengthen our relationship, which will not only benefit our students by broadening their global view, but also promote the visibility of the university.
National Chung Hsing University is located in Taichung, a city well known for its rich culture and humanitarian background. Blessed with a balmy climate and enjoying excellent geopolitical position, the College is expected to attract more talents and to cultivate their soft powers. Meanwhile, the College will continue its dedication to the pursuit of academic excellence and quality education, in the hope of making further contribution to the world and to humanity.
 
 
畢業贈言 — 薛院長給畢業學生的勉勵:  

 

腳踏實地、發揮創意、放眼國際、成就學藝

「登高自卑、行遠自邇」,基礎科學學得好,未來的發展無限寬廣。大學時期的學習與歷練就是未來繼續深造、就業或創業的基石,也是培養專業、通識及社團參與的黃金時期,更是孕育學術、產業、創意與哲學的溫床。能夠在一所綜合性的大學就讀,並享受台中優越的地理位置、山川與氣候,就是一種幸福。多元帶來豐富的色彩,跨領域學習激發創意,懂得欣賞別人的優點,讓科技與工程注入人文與藝術的內涵,您的人生會更充實圓滿。在全球化的趨勢下,我們的校園也日益國際化,如何培養自己的國際視野,排除語言與文化的障礙,迎接來自不同領域、不同國界、不同價值觀的挑戰,是身為21世紀領導人必備的能力,希望同學們自我期許,中興大學不只是培育優質的知識份子,也是各行業的領導者。

 

研究領域Research Interests

Electron Microscopy and Microanalysis, Thin Film Materials, Nanotechnology, Electronic Packaging.  
 
代表著作Selected Publications:
  • Y. H. Pai, H. F. Huang, Y. C. Chang, C. C. Chou and F. S. Shieu, 2006, “Electron-beam Reduction Method for Preparing Electrocatalytic Particles in Membrane Electrode Assemblies (MEA)”, J. Power Sources, 159, 878-884. (SCI)
  • R. S. Yu, S. C. Liang, C. J. Lu, D. C. Tsai, and F. S. Shieu, 2007, “Characterization and Optoelectronic Properties of p-type N-doped CuAlO2 Films”, Appl. Phys. Lett., 90, 19117-3. (SCI)
  • M. C. Chiu, H. C. Yao, C. J. Huang, D. C. Tsai, and F. S. Shieu, 2007, “Improvement of Dielectric Properties of Ba0.6Sr0.4TiO3 Thin Films by MgO Doping”, J. Appl. Phys., 102, 014110-8. (SCI)
  • W. K. Chao, C. M. Lee, C. C. Chao, and F. S. Shieu, 2008 “Clay as a Dispersant in the Catalyst Layer for Zinc-air Fuel Cells”, J. Power Sources, 177(2), 637-642. (SCI)
  • H. C. Yao, M. C. Chiu, D. C. Tsai, C. J. Huang, and F. S. Shieu, 2008 “Effect of Annealing on the Nb-doped TiO2 Films Prepared by DC/RF Co-sputtering”, J. Electrochem. Soc., 155(9), G173-G179. (SCI)